Plasma processing system

Patent Granted The invention provides a supplying method of a high frequency power in which, when a membrane mobility is increased and a high frequency power is impressed on a susceptor, an occurrence of an induction magnetic field is canceled. The microwave plasma treatment device 10 includes a treatment vessel 100, a susceptor 105 which is housed in the treatment vessel and on which a substrate G is mounted, three power supply cables B1-B3 which contact with the susceptor on three positions P1-P3 provided on a same circumference of the susceptor 105, and a high frequency power source 130 which is connected with the three power supply cables B1-B3 and supplies a high frequency power to the susceptor 105 from the positions P1-P3 of three or more through the three power supply cables B1-B3.