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Patent Granted The subject of the invention is to appropriately arrange the gas supply position of a microwave plasma processing system. The microwave plasma processing device 10 comprises a container 100 that plasma is excited inside; a microwave source 900 that is utilized to excite the plasma inside the container 100; coaxial tubes (e.g., 600 and 315) that allows the microwave supplied by the microwave source 900 to travel.
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