Plasma processing

Patent Granted To provide a technique capable of cleaning deposits inside a processing chamber by simple constitution without the need of a remote chamber or an exclusive microwave source or the like. The plasma processing equipment 1 turns a prescribed gas supplied into the processing chamber 5 into plasma and executes plasma processing to a body G to be processed arranged inside the processing chamber 5 by propagating microwaves propagated to a waveguide 35 to a dielectric 46 arranged on the inner surface of the processing chamber 5.