Plasma processing system

Patent Pending To provide a plasma processing apparatus for which a low frequency electromagnetic wave can be used. A plasma processing apparatus (10) is provided with a processing container (100); a microwave source (900) for outputting a microwave; an internal conductor (315a) for transmitting the microwave outputted from the microwave source (900), and a dielectric plate (305) adjacent to or in proximity to the internal conductor (315a) for transmitting the microwave transmitted through the internal conductor (315a) and outputs the microwave into the processing container (100); and a propagation disturbing section ( for instance, a groove (300a)) arranged on the inner surface of the processing container (100)