Plasma processing

Patent Pending To provide a method for processing plasma capable of preventing occurrence of abnormal discharge on a gas guiding path formed at a shower head having the function of a top plate. The plasma processing equipment comprises a gas guiding path 84 for guiding the gas containing at least plasma exciting gas into a process vessel 32 that can be depressurized, and a shower head 60 which, comprising a plurality of gas discharging openings 86, is communicated with the gas guiding path, for discharging gas into the process vessel.