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Nitride semiconductor element

Patent Granted PROBLEM TO BE SOLVED: To provide a normally-off nitride semiconductor element and a manufacturing method of the same. ; SOLUTION: The CAVET includes an n<SP>+</SP>-type GaN substrate 1, an insulating film 2 having an opening 3 formed on a main face 1a of the substrate, and a nitride semiconductor lamination structure part 4.

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