Electronics
Category
Japan, United states of America
Geographic Coverage
Not Available
Video URL
Not Available
Sale price (USD)
Not Available
Non-exclusive license price (USD)
Not Available
Exclusive license price (USD)
Not Available
Non-exclusive license royalty rate %
Availability
Plus or Premium required
IP number
Plus or Premium required
Patent family
Plus or Premium required
Number of members in the patent family
Plus or Premium required
Applicant(s)
Plus or Premium required
Inventor(s)
Plus or Premium required
Assignee(s) / Patent owner(s)
Plus or Premium required
Priority date
Plus or Premium required
Application date
Plus or Premium required
Grant Date
Plus or Premium required
IPC / #
Plus or Premium required
CPC
Plus or Premium required
USPC
Plus or Premium required
Link to patent publication
To see the additional information details please login and subscribe to a Premium account.

Plasma processing

Patent Pending PROBLEM TO BE SOLVED: To provide a plasma processing apparatus capable of generating uniform plasma stably by supplying microwave uniformly into a processing chamber from a plurality of dielectric plates, and capable of obtaining high extensibility corresponding to enlargement in area of workpieces since the microwave can be supplied to each of the plurality of dielectric plates.

MAKE AN OFFER
GET LICENSE BROKER APPLY submit an inquiry
photo To see the additional information details please login and subscribe to a Plus or Premium account.

Related IPs