Plasma processing

Patent Granted [PROBLEMS] To provide a plasma processing apparatus which can reduce the quantity of dielectric material to be used as much as possible. [MEANS FOR SOLVING PROBLEMS] A plasma processing apparatus is provided with a metal processing container (4) for storing a substrate (G) to be processed with plasma, and an electromagnetic wave source (34) for supplying the processing container (4) with an electromagnetic wave required for exciting plasma (P). The plasma processing apparatus is provided with one or more dielectric bodies (25) on the lower surface of a case (3) of the processing container (4).