Plasma treatment device

Patent Pending PROBLEM TO BE SOLVED: To measure a high frequency power in the vicinity of a substrate with respect to a plasma treatment device, a measuring apparatus, a measuring method, and a control device. ; SOLUTION: The microwave plasma treatment device 10 comprises a treating container 100 to apply a desired treatment to a substrate G by plasma, a susceptor 106 (mounting table) which is installed in the treating container 100 and mounts the substrate G, a power feeding part 108 embedded in the mounting table, and a high frequency power source 112 which is connected to the power feeding part 108 and applies a high frequency power.