Plasma processing

Patent Granted [PROBLEMS] To provide a plasma processing apparatus and a plasma processing method by which plasma can be uniformly generated on the entire lower surface of a dielectric body. [MEANS FOR SOLVING PROBLEMS] In a plasma processing apparatus (1), microwaves are permitted to propagate into a dielectric body (32) arranged on an upper surface of a processing chamber (4) through a plurality of slots (70) formed on a lower surface (31) of a waveguide tube (35), a process gas supplied into the processing chamber (4) is brought into the plasma state by electric field energy in an electromagnetic field formed on a surface of the dielectric body, and a substrate (G) is processed with plasma.