Diamond film

Patent Pending Chemical vapor deposition (CVD) can be used to produce a synthetic diamond by creating the circumstances necessary for carbon atoms in a gas to settle on a substrate in crystalline form. CVD production of diamonds has received a great deal of attention in the materials sciences because it allows many new applications of diamonds that had previously been considered too difficult to make economical. CVD diamond growth typically occurs under low pressure (1–27 kPa; 0.145–3.926 psi; 7.5-203 Torr) and involves feeding varying amounts of gases into a chamber, energizing them and providing conditions for diamond growth on the substrate.