Lithography/Quantum entangled particles

Patent Granted Quantum lithography is a type of photolithography, which exploits non-classical properties of the photons, such as quantum entanglement, in order to achieve superior performance over ordinary classical lithography. Quantum lithography is closely related to the fields of quantum imaging, quantum metrology, and quantum sensing. The effect exploits the quantum mechanical state of light called the NOON state. Quantum lithography was invented at Jonathan P. Dowling's group at JPL,[1] and has been studied by a number of groups.