Electrochemical deposition

Patent Granted Electrochemical deposition is generally used for the growth of metals and conducting metal oxides because of the following advantages: (i) the thickness and morphology of the nanostructure can be precisely controlled by adjusting the electrochemical parameters, (ii) relatively uniform and compact deposits can be synthesized in template-based structures, (iii) higher deposition rates are obtained, and (iv) the equipment is inexpensive due to the non-requirements of either a high vacuum or a high reaction temperature.