Substrate processing

特許 係属中 A treatment container of a coating and developing treatment apparatus of the present invention includes an ultraviolet irradiation unit for applying ultraviolet rays with a wavelength of 120 nm to 190 nm to a substrate, a gas supply port for supplying an inert gas, and an exhaust port for exhausting an atmosphere in the treatment container. The inert gas is supplied from the gas supply port to exhaust the atmosphere inside the treatment container through the exhaust port, whereby the inside of the treatment container is kept in an atmosphere containing no oxygen atom and no water molecule.