公式タイトルと情報はIP Exchange PlusとPremiumのユーザーのみが利用可能です。
特許 係属中 PROBLEM TO BE SOLVED: To provide a surface shape processing method and a surface shape processing device of a multilayer film which corrects a phase of a reflected wave surface with precision of subnanometer and in which shortening of processing time is attained in milling of the multilayer film utilizing ion beams.
追加情報の詳細を見るにはIP Exchange PlusまたはIP Exchange Premiumアカウントにアップグレードする必要があります
