公式タイトルと情報はIP Exchange PlusとPremiumのユーザーのみが利用可能です。
特許 権利維持 A sputtering target for production of metallic glass film, characterized in that it has a structure obtained by sintering of an atomized powder of <= 50 Vm average particle diameter having a composition of three or more elements whose main component (component of greatest atomic %) is at least one metal element selected from among Pd, Zr, Fe, Co, Cu and Ni.
追加情報の詳細を見るにはIP Exchange PlusまたはIP Exchange Premiumアカウントにアップグレードする必要があります
