PROBLEM TO BE SOLVED: To provide a gas processing apparatus using a material that can suppress entry of a corrosive gas than in comparison with a conventional apparatus and can prevent an element i...
To provide a technology which is advantageous for etching a substrate uniformly. ; SOLUTION: The etching apparatus is configured so that the first surface of a substrate having first and second sur...
http://en.wikipedia.org/wiki/Etching_(microfabrication)
Object moving device
http://en.wikipedia.org/wiki/Surface_finishing
http://en.wikipedia.org/wiki/Single_crystal
http://en.wikipedia.org/wiki/Macrocycle
Vehicle transporting apparatus
Insulating material
http://en.wikipedia.org/wiki/Laser#Semiconductor_lasers
http://en.wikipedia.org/wiki/Insulator_(electricity)
Rotary magnet sputtering apparatus
Photoelectric conversion device
Wet processing apparatus
http://en.wikipedia.org/wiki/Channelrhodopsin
Renal disease marker substance
http://en.wikipedia.org/wiki/Alloy
http://en.wikipedia.org/wiki/Semiconductor_device
http://en.wikipedia.org/wiki/Transistor
Thermoelectric conversion element
