Official title and information are available only for Plus and Premium subscribers.
Patent Pending PROBLEM TO BE SOLVED: To provide a photosensitive polymer composition used in a photofabrication process and having photocurability and light resistance. ; SOLUTION: The photosensitive polymer composition is obtained by blending a cage silicon compound formed using a compound of formula (1-1), (6-1), (11-1) or (12-1), a metal complex and an organic solvent.
To see the additional information details please login and subscribe to a Plus or Premium account.
