公式タイトルと情報はIP Exchange PlusとPremiumのユーザーのみが利用可能です。
特許 係属中 PROBLEM TO BE SOLVED: To provide a photosensitive polymer composition used in a photofabrication process and having photocurability and light resistance. ; SOLUTION: The photosensitive polymer composition is obtained by blending a cage silicon compound formed using a compound of formula (1-1), (6-1), (11-1) or (12-1), a metal complex and an organic solvent.
追加情報の詳細を見るにはIP Exchange PlusまたはIP Exchange Premiumアカウントにアップグレードする必要があります
