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Titanium oxide thin film

Patent Pending PROBLEM TO BE SOLVED: To deposit a partially nitrided titanium oxide thin film by a PLD (pulsed laser deposition) method. ; SOLUTION: A titanium oxide sintered material is irradiated with pulsed laser light in an atmosphere including at least a nitrogen element at constant gas pressure so as to form a partially nitrided titanium oxide thin film on a substrate placed at a position opposing to the titanium oxide material.

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